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Vairagar, A. V. and Mhaisalkar, S. G. and Meyer, M. A. and Krishnamoorthy, A. and Zschech, E and Gusak, A. M. (2005) Direct evidence of electromigration failure mechanism in dual-damascene Cu interconnect tree structures. Applied physics letters, Т. 87 (№ 1). pp. 1-3.