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Tang, W. and Picraux, S. T. and Huang, J. Yu and Gusak, A. M. and Tu, K. N. and Dayeh, S. A. (2013) Nucleation and Atomic Layer Reaction in Nickel Silicide for DefectEngineered Si Nanochannels. American Chemical Society. Nano Letters (№ 13). pp. 2748-2753.